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Re: X-Rite iSis and dual measurements

Andrew Rodney wrote: 
On 7/21/07 12:15 PM, "Klaus Karcher"  wrote:

Don't you think that a smart profiler could benefit from both data sets
by adjusting the data to the UV amount of the output condition?


Yes. Further, PMP does have a mode of automatically detecting UV and
compensating based on the spectral data from one set of data measurements
(we can debate how well it works, but the feature has been around long
before the iSis). So I'm confused about what the product is supposed to now
do with two sets and if this is an advantage, I hope it would be.

AFAIK this mode estimates the amount of optical brighteners in the substrate by the size of the hunch in the blue region and the gap on the short wave end of the spectrum (I'm sure Graeme can explain it much better than me). This estimation seems to work satisfactorily in common cases, but why estimating if you can measure it? And what about optical brighteners in inks? They can't be estimated this way.

Klaus

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 >Re: X-Rite iSis and dual measurements (From: Andrew Rodney <email@hidden>)



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