RE: Posterization in a Press Profile?
RE: Posterization in a Press Profile?
- Subject: RE: Posterization in a Press Profile?
- From: Roger <email@hidden>
- Date: Thu, 01 Oct 2009 08:23:08 -0400
Brian,
Terry and Mike did a wonderful and articulated job of explaining the reasons
why. There is nothing wrong with the i1pro and the ECI target. But you ran
into what I'd call limitations of current lithography by using a target
layout that consumes so much press real estate and create artificial inking
conditions -- press inking is voodoo, believe me. If I were you and if you
don't have access to an iO table, to automate the patch readings, I'd
consider running the Standard ECI Random target and measure a few targets in
patch mode for profiling. I know, patch mode is long but it will work around
the limitation of lithography and it will give you a solid basis to work
from. I occasionally measure standard IT8.7/4 targets in patch mode using a
variety of instrument and it's not so bad. It takes about 90 min to read
1617 patches, depending on the speed of the instrument -- fastest with the
Spectrodens.
If I were you, I'd push the test and take Terry on his generous offer.
Regards / Roger
> > But please, don't rerun with the *same* target layout because that
> won't
> > solve the posterization.
> > I guarantee.
>
> Why is that? Is something wrong with the ECI2002 target?
>
> Brian
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